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Photolithography (also known as optical lithography) is a process that involves using light to transfer a pattern onto a photoresist layer deposited on a sample, typically a silicon wafer. It is used in the manufacturing of integrated circuits.
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lithography photoresist light wafer used process nm also systems excimer use wavelength laser using photomask pattern resolution resist ultraviolet printing
| Subject | Predicate | Object | Confidence | Src |
|---|---|---|---|---|
| Photolithography | is a | most common method for the semiconductor fabrication of integrated circuits | 0.90 | text |
| Photolithography | is a | subclass of microlithography | 0.90 | text |
| Photolithography | is a | printing method | 0.90 | text |
| 45 nm | instance of | to avoid reflections from occurring under the photoresist and to improve the photoresist's performance at smaller semiconductor nodes | 0.80 | text |
| below | instance of | to avoid reflections from occurring under the photoresist and to improve the photoresist's performance at smaller semiconductor nodes | 0.80 | text |
| tetramethylammonium hydroxide | instance of | Metal-ion-free developers | 0.80 | text |
| the angle of incident light on a reticle | instance of | is actually a function of process factors | 0.80 | text |
| the incident light intensity distribution | instance of | is actually a function of process factors | 0.80 | text |
| xenon | instance of | sometimes in combination with noble gases | 0.80 | text |
| silicon dioxide | instance of | insulating materials | 0.80 | text |
| when exposed to photons with energy greater than the band gap | instance of | insulating materials | 0.80 | text |
| release free electrons | instance of | insulating materials | 0.80 | text |
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