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Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates…
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plasma etching surface used process gas form etch species also atoms products etcher circuits oxygen using material hydrogen integrated processes
| Subject | Predicate | Object | Confidence | Src |
|---|---|---|---|---|
| Plasma etching | is a | form of plasma processing used to fabricate integrated circuits | 0.90 | text |
| electrons | instance of | ExcitationDissociationIonizationDifferent species are present in the plasma | 0.80 | text |
| ions | instance of | ExcitationDissociationIonizationDifferent species are present in the plasma | 0.80 | text |
| radicals | instance of | ExcitationDissociationIonizationDifferent species are present in the plasma | 0.80 | text |
| and neutral particles | instance of | ExcitationDissociationIonizationDifferent species are present in the plasma | 0.80 | text |
| Plasma etching | has application | Plasma | 0.60 | section |
| Plasma etching | has application | Small | 0.60 | section |
| Plasma etching | has application | For | 0.60 | section |
| Plasma etching | has application | This | 0.60 | section |
| Plasma etching | has application | Similarly | 0.60 | section |
| Plasma etching | has application | Hydrogen | 0.60 | section |
| Plasma etching | has application | When | 0.60 | section |
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