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Interference lithography (or holographic lithography) is a technique that uses coherent light (such as light from a laser) for patterning regular arrays of fine features without the use of complex optical systems or photomasks.
Applications, Electron holographic lithography & Basic principle
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interference electron lithography coherent beam wavelength light laser using used patterning patterns nm features without coherence pattern waves beams must
| Subject | Predicate | Object | Confidence | Src |
|---|---|---|---|---|
| Interference lithography | is a | quick generation of dense features over a wide area without loss of focus | 0.90 | text |
| Interference lithography | related to Coherence requirements | For | 0.60 | section |
| Interference lithography | related to Coherence requirements | First | 0.60 | section |
| Interference lithography | related to Coherence requirements | This | 0.60 | section |
| Interference lithography | related to Coherence requirements | The | 0.60 | section |
| Interference lithography | related to Coherence requirements | Second | 0.60 | section |
| Interference lithography | related to Coherence requirements | Even | 0.60 | section |
| Interference lithography | related to External links | Large-area | 0.60 | section |
| Interference lithography | related to External links | Fraunhofer ISE | 0.60 | section |
| Interference lithography | related to Uses | The | 0.60 | section |
| Interference lithography | related to Uses | Seamless | 0.60 | section |
| Interference lithography | related to Uses | Hence | 0.60 | section |
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