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Chemical vapor deposition

Chemical vapor deposition (CVD) is a thin film deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce electrically conductive layers in the range of a few 100 nm up to a few μm.

Applications, Types & Commercially important materials prepared by CVD

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Commercially important materials prepared by CVD

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Chemical vapor deposition

Nodes116
Edges115
Triples15
Avg. degree1.98
Density0.017241
Components1

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Important terminology

cvd used substrate deposition chemical diamond process graphene gas high growth temperature plasma precursors temperatures also materials silicon chamber films

Entity relationships Subject–Predicate–Object triples

SubjectPredicateObjectConfidenceSrc
phosphineinstance ofif gases0.80text
arsine or diborane are added to the CVD chamberinstance ofif gases0.80text
surrounding pressureinstance ofgaseous catalyst-assisted CVD paves the way for synthesizing high-quality graphene for device applications while avoiding the transfer process.Physical conditionsPhysical condit…0.80text
temperatureinstance ofgaseous catalyst-assisted CVD paves the way for synthesizing high-quality graphene for device applications while avoiding the transfer process.Physical conditionsPhysical condit…0.80text
carrier gasinstance ofgaseous catalyst-assisted CVD paves the way for synthesizing high-quality graphene for device applications while avoiding the transfer process.Physical conditionsPhysical condit…0.80text
and chamber material play a big role in production of graphene.Most systems use LPCVD with pressures ranging from 1 to 1500 Painstance ofgaseous catalyst-assisted CVD paves the way for synthesizing high-quality graphene for device applications while avoiding the transfer process.Physical conditionsPhysical condit…0.80text
argon are flowed into the systeminstance ofCaution has to be exercised as high temperatures do pose higher danger levels in addition to greater energy costs.Carrier gasHydrogen gas and inert gases0.80text
frictioninstance ofis used to measure local properties0.80text
magnetism.X-ray diffraction methods are useful techniques to analyze thin filmsinstance ofis used to measure local properties0.80text
Grazing incidence X-ray diffraction can be used to qualify the phases present in deposited filmsinstance ofX-ray diffraction methods0.80text
surrounding pressureinstance ofPhysical conditionsPhysical conditions0.80text
temperatureinstance ofPhysical conditionsPhysical conditions0.80text

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