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Low-energy plasma-enhanced chemical vapor deposition

Low-energy plasma-enhanced chemical vapor deposition (LEPECVD) is a plasma-enhanced chemical vapor deposition technique used for the epitaxial deposition of thin semiconductor (silicon, germanium and SiGe alloys) films. A remote low energy, high density DC argon plasma is employed to efficiently decompose the gas phase precursors while leaving the…

Works, LEPECVD reactor & Working principle

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LEPECVD reactor

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Low-energy plasma-enhanced chemical vapor deposition

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Avg. degree1.94
Density0.058824
Components1

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plasma substrate lepecvd deposition chamber high reactor source silicon growth density energy epitaxial germanium discharge rate used low gas argon

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