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In physics, sputtering is a phenomenon in which microscopic particles of a solid material are ejected from its surface, after the material is itself bombarded by energetic particles of a plasma or gas. It occurs naturally in outer space, and can be an unwelcome source of wear in precision components. However, the fact that it can be made to act on…
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target surface ions sputter ion energy material plasma etching atoms deposition used physical also process sputtered solid thin potential cleaning
| Subject | Predicate | Object | Confidence | Src |
|---|---|---|---|---|
| Sputtering | is a | phenomenon in which microscopic particles of a solid material are ejected from its surface | 0.90 | text |
| overheating | instance of | Sputter cleaning has some potential problems | 0.80 | text |
| gas incorporation in the surface region | instance of | Sputter cleaning has some potential problems | 0.80 | text |
| bombardment | instance of | Sputter cleaning has some potential problems | 0.80 | text |
| pinning of the Fermi level | instance of | there may be inevitable interfacial consequences | 0.80 | text |
| caused by damage-related interface gap states | instance of | there may be inevitable interfacial consequences | 0.80 | text |
| resulting in the formation of Schottky-barrier impeding carrier transport | instance of | there may be inevitable interfacial consequences | 0.80 | text |
| telescopes | instance of | ensuring high reflectivity and durability for applications | 0.80 | text |
| cameras | instance of | ensuring high reflectivity and durability for applications | 0.80 | text |
| and laser systems | instance of | ensuring high reflectivity and durability for applications | 0.80 | text |
| Sputtering | has application | When | 0.60 | section |
| Sputtering | has application | DC | 0.60 | section |
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