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Atomic layer deposition

Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants"). These precursors react with the surface of a material one at a time in a sequential…

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Overview

Introduction

History

Surface reaction mechanisms

Applications

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Atomic layer deposition

Nodes116
Edges115
Triples38
Avg. degree1.98
Density0.017241
Components1

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Atomic layer deposition

Top relations

related to 2000s · 19
Atomic layer deposition → ALD, ALE, CMOS, Doan, DRAM, Finland, Gurtej Singh Sandhu, History, In, Intel Corporation, It, Micron Technology, ML, Soviet Union, This, To, Trung, Virtual Project, VPHA
related to Introduction · 13
Atomic layer deposition → ALD, An, By, Consequently, Currently, During, In, Knoops, Mackus, Miikkulainen, Moore's, Puurunen, Schneider
related to External links · 2
Atomic layer deposition → ALD, Atomic

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Important terminology

ald surface process deposition used layer precursors use metal films also ale reactions deposited thin high using metals atomic substrate

Entity relationships Subject–Predicate–Object triples

SubjectPredicateObjectConfidenceSrc
chemical vapor depositioninstance ofIn contrast to other techniques0.80text
Al2O3instance ofand materials that have been explored include inorganic metal oxides0.80text
NH3 or pyridineinstance ofTypical catalysts for SiO2 ALD include Lewis bases0.80text
SiO2instance ofTypical catalysts for SiO2 ALD include Lewis bases0.80text
Atomic layer depositionrelated to 2000sIn0.60section
Atomic layer depositionrelated to 2000sGurtej Singh Sandhu0.60section
Atomic layer depositionrelated to 2000sTrung0.60section
Atomic layer depositionrelated to 2000sDoan0.60section
Atomic layer depositionrelated to 2000sMicron Technology0.60section
Atomic layer depositionrelated to 2000sDRAM0.60section
Atomic layer depositionrelated to 2000sThis0.60section
Atomic layer depositionrelated to 2000sIntel Corporation0.60section

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