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The Wright etch (also Wright-Jenkins etch) is a preferential etch for revealing defects in <100>- and <111>-oriented, p- and n-type silicon wafers used for making transistors, microprocessors, memories, and other components. Revealing, identifying, and remedying such defects is essential for progress along the path predicted by Moore's law. It was…
Etch formula, Etch mechanism & Summary
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etch wright silicon -oriented defects 100 wafers figure sirtl etching shows dislocation surface acid minutes wafer secco comparison preferential 111
| Subject | Predicate | Object | Confidence | Src |
|---|---|---|---|---|
| Wright etch | related to Etch formula | The | 0.60 | section |
| Wright etch | related to Etch formula | Wright | 0.60 | section |
| Wright etch | related to Etch formula | HF | 0.60 | section |
| Wright etch | related to Etch mechanism | The Wright | 0.60 | section |
| Wright etch | related to Etch mechanism | This | 0.60 | section |
| Wright etch | related to Etch mechanism | Robbins | 0.60 | section |
| Wright etch | related to Etch mechanism | Schwartz | 0.60 | section |
| Wright etch | related to Etch mechanism | HF | 0.60 | section |
| Wright etch | related to Etch mechanism | HNO3 | 0.60 | section |
| Wright etch | related to Etch mechanism | H2O | 0.60 | section |
| Wright etch | related to Etch mechanism | CH3COOH | 0.60 | section |
| Wright etch | related to Etch mechanism | Briefly | 0.60 | section |
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