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In semiconductor manufacturing, isotropic etching is a method commonly used to remove material from a substrate via a chemical process using an etchant substance. The etchant may be in liquid-, gas- or plasma-phase, although liquid etchants such as buffered hydrofluoric acid (BHF) for silicon dioxide etching are more commonly used. Unlike anisotropic…
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etching isotropic may substrate etchant commonly used process etch direction anisotropic semiconductor manufacturing method remove material via chemical using substance
| Subject | Predicate | Object | Confidence | Src |
|---|---|---|---|---|
| Isotropic etching | is a | method commonly used to remove material from a substrate via a chemical process using an etchant substance | 0.90 | text |
| buffered hydrofluoric acid | instance of | although liquid etchants | 0.80 | text |
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