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The "32 nm" node is the step following the "45 nm" process in CMOS (MOSFET) semiconductor device fabrication. "32-nanometre" refers to the average half-pitch (i.e., half the distance between identical features) of a memory cell at this technology level.
Technology, Technology demos & Overview
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nm 32 process technology node using processors intel first commercial cell gate 22 lithography used 2011 intel's released 2010 device
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