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65 nm process

The 65 nm process is an advanced lithographic node used in volume CMOS (MOSFET) semiconductor fabrication. Printed linewidths (i.e. transistor gate lengths) can reach as low as 25 nm on a nominally 65 nm process, while the pitch between two lines may be greater than 130 nm.

Technology, Processors using 65 nm manufacturing technology & Process node

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Processors using 65 nm manufacturing technology

EEGSPStwoIntel CorePentium 4
28 related topics

Process node

ComparisonRibosomesSiliconLattice constantAtoms
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Overview

LithographicNodeCMOSTransistor gateSemiconductor fabrication
6 related topics

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Process node

Processors using 65 nm manufacturing technology

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65 nm process

Nodes55
Edges54
Triples1
Avg. degree1.96
Density0.036364
Components1

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65 nm process

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is a · 1
65 nm process → advanced lithographic node used in volume CMOS

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Important terminology

nm 65 process gate 25 intel 2005 transistor pitch node 2007 leakage technology transistors core august used semiconductor fabrication printed

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SubjectPredicateObjectConfidenceSrc
65 nm processis aadvanced lithographic node used in volume CMOS0.90text

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